青云英语翻译

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In this article, we will analyze the 10nm to neiguang interference lithography patterns using extreme ultraviolet. In order to achieve high resolution, high efficiency, and low line edge roughness of Bragg gratings are required. We report the fabrication of efficient Mo gratings on membranes at sub-

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In this article, we will analyze the moment within 10 NM of the pattern uses a UV-Interference lithography. In order to achieve high-resolution, high-efficiency, uniformity and Line Edge roughness, low light is required. We

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In this paper, we will analyze in 10nm the photoetching design use side ultraviolet interference photoetching technology.In order to realize the high resolution, highly effective, even and the line%
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